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Chih-Han Lin

Hsinchu, Taiwan

Chih-Han Lin

This inventor holds 422 USPTO granted patents and 69 published patent applications, primarily in Semiconductor Manufacturing (CPC class H01L29-66545). Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Han Lin. Retrieved from https://idiyas.com/inventor/chih-han-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 422 

% Patents Active = 96.2

Average Co-Inventor Count = 3.0

ph-index = 15

Forward Citations = 1,041(Granted Patents)

Forward Citations (Not Self Cited) = 755(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Tainan, TW (2011 - 2012)
  • New Taipei, TW (2017)
  • Zhubei, TW (2014 - 2018)
  • Hsin-Chu, TW (2015 - 2024)

Company Filing History:

goldMedal422 out of 43,553 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2011-2026

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Areas of Expertise:
FinFET
Gate Structures
Interconnect Design
Semiconductor Devices
Epitaxy Process
Transistor Optimization
Stacked Layers
Dummy Gate
Alignment Structure
Dielectric Layer
Anti-Adhesion Layer
Spacer Thickness
422 patents (USPTO):Explore Patents
1. 12772513 - Semiconductor device with improved source/drain profile and methods of fabrication thereof (2026-10-20),
2. 12713640 - FINFET ISOLATION STRUCTURE (2026-08-18),
3. 12557369 - Gate profile control through sidewall protection during etching (2026-02-17),
4. 12538774 - Interconnection structure with anti-adhesion layer (2026-01-27),
5. 12525482 - Semiconductor devices and methods of manufacturing thereof (2026-01-13),
6. 12484276 - Replacement structures (2025-11-25),
7. 12476141 - Fin field effect transistor (FinFET) device structure with interconnect structure (2025-11-18),
8. 12463047 - Methods for forming stacked layers and devices formed thereof (2025-11-04),
9. 12426334 - FinFET device and method (2025-09-23),
10. 12426311 - Gate structures and spacers in semiconductor devices and methods of manufacturing thereof (2025-09-23),
11. 12408411 - Semiconductor device (2025-09-02),
12. 12408314 - Semiconductor devices and methods of manufacturing thereof (2025-09-02),
13. 12402402 - Transistor gate profile optimization (2025-08-26),
14. 12402353 - Method of manufacturing a semiconductor device and a semiconductor device (2025-08-26),
15. 12389669 - Enlarging spacer thickness by forming a dielectric layer over a recessed interlayer dielectric (2025-08-12),

Title: Chih-Han Lin: Paving the Way for Telecommunications and Electronics Advancements

Introduction:

Chih-Han Lin, a renowned innovator in the field of telecommunications and electronics, has made significant contributions throughout his career. With a strong focus on semiconductor devices, his groundbreaking work continues to drive advancements in the industry. Let's delve into his latest patents, career highlights, and notable collaborations.

Latest Patents:

Chih-Han Lin's latest patents demonstrate his expertise in semiconductor device design and manufacturing methods. These patents showcase his innovative ideas to enhance device performance and efficiency. One such patent involves a semiconductor device with a substrate, shallow trench isolation (STI) structure, isolation structure, and gate stack. The high-k dielectric layer in the gate stack plays a crucial role in optimizing device functionality. Another patent emphasizes the use of fin structures, gate electrode structures, and insulating layers to achieve improved performance in semiconductor devices.

Career Highlights:

With an impressive portfolio of 332 patents, Chih-Han Lin's work has had a lasting impact on the industry. Over the years, he has actively sought innovative solutions to advance telecommunications and electronics. Lin's contributions have significantly influenced the development of cutting-edge semiconductor devices, transforming the way we communicate and interact with technology. His commitment to pushing the boundaries of possibilities has earned him well-deserved recognition and acclaim.

Collaborations:

Chih-Han Lin has had the privilege of collaborating with esteemed colleagues, further amplifying his impact in the industry. Notably, he has worked closely with Che-Cheng Chang and Horng-Huei Tseng, who share his passion for innovation and have contributed significantly to the field. Collaborative efforts between these talented individuals have resulted in several breakthroughs, emphasizing the power of teamwork in driving technological advancements.

Conclusion:

Chih-Han Lin's relentless pursuit of innovation in telecommunications and electronics has set him apart as a visionary in the industry. His remarkable career, underpinned by an extensive patent portfolio, showcases his commitment to transforming technology and improving lives. As he continues to push the boundaries of what is possible, the industry eagerly awaits his future contributions, knowing that his work will shape the future of telecommunications and electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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