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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12791951 B1

PDFFull Text
Date of Patent:
Nov. 10, 2026

Filed:

Jan. 18, 2024

Substrate treatment method and substrate treatment apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takeshi Shimoaoki, Koshi City, JP;

Arnaud Alain Jean Dauendorffer, Leuven, BE;

Keisuke Yoshida, Nirasaki City, JP;

Shinichiro Kawakami, Koshi City, JP;

Yuya Kamei, Koshi City, JP;

Soichiro Okada, Leuven, BE;

Takafumi Niwa, Koshi City, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Posz Law Group, PLC

Primary Examiner:

Caleen O Sullivan

Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H10P 76/40 (2026.01);
U.S. Cl.
CPC ...
G03F 7/706837 (2023.05); G03F 7/161 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/70008 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70866 (2013.01); H10P 76/4085 (2026.01); G03F 7/0042 (2013.01);
Abstract

A substrate treatment method includes: developing a substrate which has a coating film of an inorganic resist formed on a base film thereon and has been subjected to an exposure treatment, with a developing solution to form a pattern of the inorganic resist; supplying an embedding solution to the developed substrate to fill a space between adjacent protrusions of the pattern; drying the filled embedding solution to form an embedded film on the substrate; and reducing a thickness of the embedded film by an ultraviolet ray.

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Shimoaoki, Takeshi. (2026). Substrate treatment method and substrate treatment apparatus (U.S. Patent No. 12791951). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12791951

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