Koshi, Japan

Takeshi Shimoaoki


Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Kumamoto, JP (2008 - 2019)
  • Koshi, JP (2011 - 2021)

Company Filing History:


Years Active: 2008-2021

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8 patents (USPTO):Explore Patents

Title: Innovations by Takeshi Shimoaoki

Introduction

Takeshi Shimoaoki is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 8 patents. His work focuses on improving the efficiency and uniformity of processing methods in semiconductor manufacturing.

Latest Patents

One of his latest patents is a substrate processing method and recording medium capable of suppressing non-uniformity in the degree of progression of processing depending on the position on the substrate. This method involves forming a liquid puddle of a mixed solution and rotating the substrate at varying speeds to ensure even processing. Another notable patent is a development processing apparatus that includes a rotary holding unit for wafers and a developer supply unit. This apparatus is designed to enhance the control of developer ejection while managing the rotation speed of the wafer.

Career Highlights

Takeshi Shimoaoki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His innovative approaches have contributed to advancements in development processing methods, making him a valuable asset to his organization.

Collaborations

He has collaborated with notable coworkers such as Yusaku Hashimoto and Masahiro Fukuda, further enhancing the innovative environment at Tokyo Electron Limited.

Conclusion

Takeshi Shimoaoki's contributions to substrate processing and his innovative patents reflect his expertise and dedication to advancing technology in the semiconductor industry. His work continues to influence the field and drive progress in manufacturing techniques.

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