The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Dec. 26, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takahiro Takumi, Kumamoto, JP;

Takeshi Shimoaoki, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67023 (2013.01);
Abstract

A liquid processing method includes: a substrate processing process for allowing a processing liquid to flow through a flow path connecting a reservoir and a processing liquid supply, and be discharged to a substrate from the processing liquid supply, thereby processing the substrate; a stay process for filling the flow path with a liquid and keeping the liquid stay in the flow path; a flow-through process for allowing the staying liquid to flow through the flow path; a signal acquisition process for irradiating the flow path with a light by a light irradiator and receiving the light from the flow path by the light receiver, to acquire a detection signal output from the light receiver according to a foreign substance in the liquid; and a response process for estimating an abnormal location in the flow path based on the detection signal, and presenting or executing a response operation.


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