The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
May. 16, 2024
Tokyo Electron Limited, Tokyo, JP;
Chishio Koshimizu, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
In a plasma processing apparatus described herein, a bias power supply supplies an electric bias energy having a bias frequency to a substrate support unit at a timing specified by a first clock signal. A radio-frequency power supply outputs a source radio-frequency power having a source frequency adjusted at a timing specified by a second clock signal, when the electric bias energy is being supplied to the substrate support unit. The second clock signal has a frequency higher than the bias frequency, and is synchronized with the first clock signal.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile