The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
Jun. 19, 2023
Tokyo Electron Limited, Tokyo, JP;
Takumi Honda, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus includes a rinsing tank, a processing tank, an acquisition unit, a concentration adjusting unit, and a concentration controlling unit. The rinsing tank retains rinse liquid including water, and in which substrates including inorganic films are dipped to execute a rinsing process. The processing tank retains phosphoric acid processing liquid, and in which the rinsing-processed substrates are dipped to execute an etching process. The acquisition unit acquires the number of the substrates to be collectively dipped in the processing tank. The concentration adjusting unit adjusts a concentration of the phosphoric acid processing liquid. The concentration controlling unit is configured to: based on the number, acquire a brought-in amount that is an amount of the rinse liquid brought in the processing tank along with the substrates; and control the concentration adjusting unit based on the brought-in amount to adjust a concentration of the phosphoric acid processing liquid.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile