The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Oct. 02, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Ryo Matsubara, Kurokawa-gun, JP;

Atsushi Takahashi, Kurokawa-gun, JP;

Yuta Nakane, Kurokawagun, JP;

Noboru Saito, Kurokawa-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 50/28 (2026.01); H01J 37/32 (2006.01); H10P 50/00 (2026.01); H10P 50/26 (2026.01);
U.S. Cl.
CPC ...
H10P 50/283 (2026.01); H01J 37/32899 (2013.01); H10P 50/267 (2026.01); H10P 50/71 (2026.01); H10P 50/73 (2026.01); H01J 37/32091 (2013.01); H01J 37/321 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract

In one exemplary embodiment, there is provided an etching method. The method includes (a) preparing a substrate, the substrate comprising a silicon-containing film and a mask, the silicon-containing film including a recess, the mask being provided on the silicon-containing film and including an opening that exposes the recess; (b) forming a carbon-containing film on a side wall of the silicon-containing film, the side wall defining the recess; and (c) by using a plasma generated from a processing gas, forming a protective film containing tungsten on the carbon-containing film and etching the silicon-containing film in the recess, the processing gas including a fluorine-containing gas and a tungsten-containing gas.


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Matsubara, Ryo. (2026). Etching method and plasma processing system (U.S. Patent No. 12796361). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12796361

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