Koshi, Japan

Masami Akimoto

USPTO Granted Patents = 103 


Average Co-Inventor Count = 2.6

ph-index = 30

Forward Citations = 3,127(Granted Patents)


Inventors with similar research interests:


Location History:

  • Kikuchi, JP (1991)
  • Kikuyo, JP (1991 - 1993)
  • Tosu, JP (1997)
  • Kumamoto-ken, JP (2000 - 2004)
  • Kikuyo-Machi, JP (2003 - 2005)
  • Koshi-machi, JP (2007)
  • Kikuchi-gun, JP (2002 - 2013)
  • Kumamoto, JP (1993 - 2018)
  • Koshi, JP (2010 - 2023)

Company Filing History:


Years Active: 1991-2025

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Areas of Expertise:
Substrate Processing
Substrate Cleaning
Liquid Processing
Coating And Developing
Film Forming
Semiconductor Manufacturing
Heating Apparatus
Coating Method
Substrate Treatment
Transfer System
Developing Treatment
103 patents (USPTO):Explore Patents

Title: Masami Akimoto: Innovations Driving Substrate Processing Technology

Introduction:

Meet Masami Akimoto, a highly accomplished inventor and researcher hailing from Koshi, Japan. With an impressive portfolio of 98 patents under his belt, Masami Akimoto has made significant contributions to the field of substrate processing apparatus technology. His pioneering work has revolutionized the way substrates are processed, incorporating advanced features for enhanced precision and efficiency.

Latest Patents:

Masami Akimoto's recent patents reflect his commitment to advancing substrate processing techniques. One notable patent is the "Substrate Processing Apparatus with Moving Device for Connecting and Disconnecting Heater Electrodes and Substrate Processing Method Thereof." This invention involves a sophisticated apparatus that includes a rotation driving device, electric heater, processing cup, and processing liquid nozzle. The integration of these features enables precise substrate processing while ensuring efficient heat transfer and liquid application.

Another innovative invention is the "Substrate Processing Apparatus Including Periphery Cover Body." This patent showcases Masami Akimoto's expertise in developing substrate processing technologies that provide optimal thermal management. The inclusion of an accommodation space, surrounded by a periphery cover body, enables effective heat transfer during processing while maintaining a sealed environment.

Career Highlights:

During his career, Masami Akimoto has been associated with esteemed organizations known for their technological advancements in the semiconductor manufacturing industry. He has worked with Tokyo Electron Limited, a globally renowned company specializing in semiconductor production equipment. Additionally, he has contributed his expertise to Tokyo Electron Kyushu Limited, a subsidiary of Tokyo Electron Limited. These experiences have allowed him to collaborate with industry experts and gain insights into cutting-edge technologies in substrate processing.

Collaborations:

Masami Akimoto has had the opportunity to collaborate with accomplished innovators, further enhancing his contributions to the field. Notably, he has worked closely with Issei Ueda and Takahiro Kitano, experts in substrate processing and semiconductor manufacturing. Together, they have collectively advanced the field of substrate processing apparatus technology, exploring new frontiers and elevating industry standards.

Conclusion:

Masami Akimoto's extensive experience and numerous patents in substrate processing apparatus highlight his exceptional contributions to the field of semiconductor manufacturing. His innovations have paved the way for enhanced substrate processing, incorporating features that improve precision, efficiency, and thermal management. Masami Akimoto's dedication to pushing boundaries and collaborating with experts in the field has undoubtedly solidified his status as a trailblazer in substrate processing technology.

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