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Tokyo Electron Kyushu Limited

USPTO Granted Patents = 85

Forward Citations = 3,285

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105 inventors (with patents filed for the assignee):

Masami Akimoto (17 out of 105 patents)

Kiyohisa Tateyama (15 out of 67 patents)

Akihiro Fujimoto (12 out of 32 patents)

4. Takashi Takekuma (9 out of 18 patents)

5. Mitsuo Nishi (7 out of 11 patents)

6. Takayuki Tomoeda (7 out of 11 patents)

7. Hidetami Yaegashi (6 out of 40 patents)

8. Naruaki Iida (6 out of 47 patents)

9. Michiaki Matsushita (6 out of 15 patents)

10. Masafumi Nomura (6 out of 14 patents)

11. Shori Mokuo (6 out of 13 patents)

12. Shinzi Kitamura (6 out of 6 patents)

13. Takahide Fukuda (6 out of 7 patents)

14. Hiroyuki Matsukawa (6 out of 6 patents)

15. Masaaki Murakami (6 out of 6 patents)

Core Competencies:

Substrate Processing

Coating Methods

Resist Processing

Cleaning Apparatus

Drying Apparatus

Heat Treatment

Spin Coating

Substrate Transfer

Wafer Processing

Hydrophobic Treatment

Scrubbing Methods

Film Formation

85 patents: Sort by Forward Citations

1. 6063190 - Method of forming coating film and apparatus therefor (2000-05-16),

2. 6054181 - Method of substrate processing to form a film on multiple target objects (2000-04-25),

3. 6022185 - Substrate transferring device (2000-02-08),

4. 5965200 - Processing apparatus and processing method (1999-10-12),

5. 5964954 - Double-sided substrate cleaning apparatus and cleaning method using the (1999-10-12),

6. 5942035 - Solvent and resist spin coating apparatus (1999-08-24),

7. 5882426 - Method of cleaning a substrate by scrubbing (1999-03-16),

8. 5871584 - Processing apparatus and processing method (1999-02-16),

9. 5853803 - Resist processing method and apparatus (1998-12-29),

10. 5826130 - Apparatus and method for developing resist coated on substrate (1998-10-20),

11. 5826129 - Substrate processing system (1998-10-20),

12. 5817156 - Substrate heat treatment table apparatus (1998-10-06),

13. 5803932 - Resist processing apparatus having an interface section including two (1998-09-08),

14. 5779796 - Resist processing method and apparatus (1998-07-14),

15. 5762745 - Substrate processing apparatus (1998-06-09),

Company Overview

Tokyo Electron Kyushu Limited, based in Tosu, Japan, specializes in advanced substrate processing technologies essential for semiconductor manufacturing. The company focuses on various core technology areas, including coating methods, resist processing, and cleaning apparatus, which are critical for ensuring high-quality substrate preparation. Additionally, it develops innovative solutions for drying and heat treatment processes, as well as substrate transfer systems, contributing to the efficiency and effectiveness of semiconductor fabrication.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

85 Patents

#2 in Tosu

#1,254 in Japan

#8,958 in the World

Tokyo Electron Kyushu Limited

Forward Citations = 3,285

105 inventors:

Masami Akimoto (17 out of 105 patents)

Kiyohisa Tateyama (15 out of 67 patents)

Akihiro Fujimoto (12 out of 32 patents)

4. Takashi Takekuma (9 out of 18 patents)

5. Mitsuo Nishi (7 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Tokyo Electron Kyushu Limited. Retrieved from https://idiyas.com/company/tokyo-electron-kyushu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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