Kumamoto, Japan

Hiroyuki Matsukawa

This inventor holds 6 USPTO granted patents. Top assignees: Tokyo Electron Kyushu Limited, Tokyo Electron Limited. Active years: 1996-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Matsukawa. Retrieved from https://idiyas.com/inventor/hiroyuki-matsukawa-34gui89v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.8

ph-index = 6

Forward Citations = 357(Granted Patents)


Company Filing History:


Years Active: 1996-2000

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6 patents (USPTO):Explore Patents

Title: Innovations of Hiroyuki Matsukawa

Introduction

Hiroyuki Matsukawa is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of six patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of substrate treatment processes.

Latest Patents

One of Matsukawa's latest patents is a method of substrate processing to form a film on multiple target objects. This innovative method involves subjecting a plurality of wafers to coating and heating treatments. A first boat is placed on a stage arranged in an interface section, capable of containing the wafers stacked at intervals in a vertical direction. The stage can move horizontally and has multiple positions for placing various boats. The wafers are conveyed from a supply section to a coating section, where they undergo coating treatment one by one. After the coating treatment, the wafers are moved to the interface section and loaded into the first boat. The first boat is then conveyed to a heating section, where the wafers receive simultaneous heating treatment.

Another significant patent is a double-sided substrate cleaning apparatus and cleaning method. This apparatus includes a carrier station for loading and unloading a carrier that stores the objects to be processed. It features a convey mechanism for transporting the object, at least one cleaning mechanism for cleaning the object along the convey path, and an object reversing mechanism for reversing the object during the cleaning process.

Career Highlights

Matsukawa has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate processing.

Collaborations

Matsukawa has collaborated with notable colleagues such as Akihiro Fujimoto and Takashi Takekuma. These collaborations have contributed to the advancement of technology in the field of substrate processing.

Conclusion

Hiroyuki Matsukawa's contributions to substrate processing through his innovative patents demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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