The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 1997

Filed:

Feb. 02, 1996
Applicant:
Inventors:

Hiroyuki Matsukawa, Kumamoto, JP;

Akira Yonemizu, Kumamoto, JP;

Michiaki Matsushita, Yatsushiro, JP;

Akihiro Fujimoto, Kumamoto-ken, JP;

Takashi Takekuma, Yamaga, JP;

Hidetami Yaegashi, Kokubunji, JP;

Takahide Fukuda, Kumamoto, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427271 ; 427384 ;
Abstract

There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.


Find Patent Forward Citations

Matsukawa, Hiroyuki. (1997). Resist treating method (U.S. Patent No. 5686143). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5686143

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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