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For the Inventor, By the Inventor

Kumamoto, Japan

Kiyohisa Tateyama

This inventor holds 67 USPTO granted patents, primarily in Semiconductor Processing (CPC class 1183). Top assignees: Tokyo Electron Limited, Tokyo Electron Kyushu Limited, Kabushiki Kaisha Toshiba. Active years: 1993-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyohisa Tateyama. Retrieved from https://idiyas.com/inventor/kiyohisa-tateyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 67

% Patents Active = 89.6

Average Co-Inventor Count = 2.1

ph-index = 26

Forward Citations = 1,968(Granted Patents)

Forward Citations (Not Self Cited) = 1,929(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Tosu, JP (1997)
  • Kikuchi-Gun, JP (2004)
  • Kumamoto, JP (1993 - 2005)
  • Kumamoto-ken, JP (1999 - 2007)

Company Filing History:

goldMedal66 out of 10,918 
 
Tokyo Electron Limited
 patents
silverMedal15 out of 85 
 
Tokyo Electron Kyushu Limited
 patents
bronzeMedal2 out of 53,276 
 
Kabushiki Kaisha Toshiba
 patents
4. 1 out of 1 
 
Electron Kyushu Limited
 patent
5. 1 out of 1 
 
Tokyo Electron Kyuchu Limited
 patent
6. 1 out of 3 
 
Tokyo Electron Saga Kabushiki Kaisha
 patents
7. 1 out of 29 
 
Tokyo Electron Tohoku Limited
 patents
where one patent can have more than one assignee

Years Active: 1993-2007

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Areas of Expertise:
Semiconductor Process
Substrate Treatment
Film Forming
Cooling Device
Coating Method
Substrate Conveying
Processing Apparatus
Cleaning Treatment
Heat Treatment
Deaerating Apparatus
Resist Application
Substrate Processing
67 patents (USPTO):Explore Patents
1. 7182531 - Developing method and apparatus (2007-02-27),
2. 7101646 - Developing method and apparatus (2006-09-05),
3. 6969572 - Developing method and apparatus (2005-11-29),
4. 6962477 - Apparatus for and method of transferring substrates (2005-11-08),
5. 6889764 - Cooling device and cooling method (2005-05-10),
6. 6837672 - Apparatus for and method of transferring substrates (2005-01-04),
7. 6799910 - Processing method and processing apparatus (2004-10-05),
8. 6749688 - Coating method and apparatus for semiconductor process (2004-06-15),
9. 6706322 - Film forming apparatus and film forming method (2004-03-16),
10. 6635113 - Coating apparatus and coating method (2003-10-21),
11. 6451515 - Substrate treating method (2002-09-17),
12. 6443641 - Substrate process method and substrate process apparatus (2002-09-03),
13. 6391110 - Method and apparatus for cleaning treatment (2002-05-21),
14. 6361600 - Film forming apparatus and film forming method (2002-03-26),
15. 6299938 - Apparatus and method of applying resist (2001-10-09),

Title: Kiyohisa Tateyama: Innovator in Developing Methods and Apparatus

Introduction

Kiyohisa Tateyama, located in Kumamoto, Japan, is a prolific inventor known for his significant contributions to developing methods and apparatus. With a remarkable total of 67 patents to his name, Tateyama has established himself as a leading figure in the field of innovation, particularly within the semiconductor industry.

Latest Patents

Among his latest innovations, Tateyama has developed a cutting-edge method and apparatus for measuring resist concentration in developing solutions. This system features a concentration measuring unit that extracts part of the developing fluid from a blending tank to measure the resist concentration using absorption photometry. The detected concentration is then relayed to a control unit that effectively manages valves for a TMAH concentrate solution, a solvent pipe, and a drain pipe. This meticulous control ensures that the TMAH concentration corresponds accurately with the measured resist concentration value, achieving a consistent developing rate. As a result, even when the developing fluid is reused multiple times, uniformity in development is maintained, enhancing process efficiency and reliability.

Career Highlights

Tateyama has made a significant impact while working with notable companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His tenure at these organizations has been marked by a strong focus on innovation and excellence in technological advancements.

Collaborations

Throughout his career, Kiyohisa Tateyama has collaborated with esteemed professionals in the industry, including Kimio Motoda and Hideyuki Takamori. These collaborations have undoubtedly enriched his work, enabling significant advancements in the methodologies he developed.

Conclusion

In summary, Kiyohisa Tateyama's contributions to the field of developing methods and apparatus are invaluable. With his extensive patent portfolio and collaborative spirit, he continues to influence and advance the semiconductor sector. His work not only enhances development processes but also paves the way for future innovations in this critical industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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