Company Filing History:

13 out of 10,307

Tokyo Electron Limited

patents

6 out of 85

Tokyo Electron Kyushu Limited

patents

1 out of 13

Tokyo Electron Saga Limited

patents

where one patent can have more than one assignee

Years Active: 1993-2012

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8216391 - Substrate processing apparatus and substrate processing method (2012-07-10),

2. 6954585 - Substrate processing method and apparatus (2005-10-11),

3. 6715348 - Method and apparatus for detecting liquid level (2004-04-06),

4. 6573482 - Heating device, liquid processing apparatus using the heating device and method of detecting failure thereof (2003-06-03),

5. 6022185 - Substrate transferring device (2000-02-08),

6. 5911232 - Ultrasonic cleaning device (1999-06-15),

7. 5845660 - Substrate washing and drying apparatus, substrate washing method, and (1998-12-08),

8. 5671544 - Substrate drying apparatus and substrate drying method (1997-09-30),

9. 5666381 - Communication system used in semiconductor device manufacturing equipment (1997-09-09),

10. 5575079 - Substrate drying apparatus and substrate drying method (1996-11-19),

11. 5406092 - Apparatus and method using optical sensors recessed in channel walls for (1995-04-11),

12. 5319216 - Substrate detector with light emitting and receiving elements arranged (1994-06-07),

13. 5266812 - Substrate detector with light emitting and receiving elements arranged (1993-11-30),

Title: Shori Mokuo: Innovator in Substrate Processing Technology

Introduction

Shori Mokuo is a prominent inventor based in Tosu, Japan, known for his significant contributions to substrate processing technology. With a total of 13 patents to his name, Mokuo has developed innovative solutions that enhance the efficiency and effectiveness of substrate processing methods.

Latest Patents

Mokuo's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus features a simplified structure that reduces the amount of process liquid used while maintaining temperature stability. This apparatus includes a processing unit that holds a substrate and a processing bath that can accommodate multiple substrates simultaneously. The transfer unit allows for the simultaneous transfer of substrates, optimizing the processing workflow. Additionally, his substrate processing method involves heating a wafer to a predetermined temperature while ensuring uniform supply of processing fluid, which improves throughput and homogenization during processing.

Career Highlights

Throughout his career, Shori Mokuo has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to refine his expertise in substrate processing technologies and contribute to advancements in the field.

Collaborations

Mokuo has collaborated with esteemed colleagues, including Kenji Yokomizo and Hiroshi Tanaka, further enhancing his innovative work in substrate processing.

Conclusion

Shori Mokuo's contributions to substrate processing technology through his patents and career achievements highlight his role as a key innovator in the industry. His work continues to influence advancements in substrate processing methods and apparatuses.

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