The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2003

Filed:

May. 01, 2001
Applicant:
Inventor:

Shori Mokuo, Tosu, JP;

Assignee:

Tokyo Electron Limited, Tokyo-To, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 1/02 ;
U.S. Cl.
CPC ...
H05B 1/02 ;
Abstract

A liquid processing apparatus includes a liquid processing unit for supplying objects to be processes, such as wafers W, with a processing liquid for liquid processing, a processing-liquid supplying unit for supplying heated processing liquids to the liquid processing unit and a heating unit for heating the liquids up to a predetermined temperature. The heating unit has a heater for heating the liquids , a power supply circuit for supplying the heater with electricity, a temperature sensor and a temperature regulator both forming an output control unit for controlling an output from a power source to the heater , a solid state relay for switching on/off the operation of the power supply circuit by signals from the temperature regulator , and failure detecting units. The failure detecting units include a contact monitor for monitoring an ON/OFF contact in a power switch , a primary-side signal detecting monitor for detecting ON/OFF signals from the temperature regulator to the solid state relay , and a secondary output voltage detecting monitor for detecting secondary-side ON/OFF signals of the solid state relay , providing a heating device capable of determining the cause of failure finely and also the liquid processing apparatus using the heating device, which is used for applying a designated liquid processing to various kinds of substrates, for example, semiconductor wafers, LCD substrates, etc.


Find Patent Forward Citations

Mokuo, Shori. (2003). Heating device, liquid processing apparatus using the heating device and method of detecting failure thereof (U.S. Patent No. 6573482). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6573482

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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