The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Apr. 17, 2007
Satoshi Kaneko, Koshi, JP;
Kazuhisa Matsumoto, Koshi, JP;
Norihiro Ito, Koshi, JP;
Masami Akimoto, Koshi, JP;
Takayuki Toshima, Koshi, JP;
Hiromitsu Nanba, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Kazuhisa Matsumoto, Koshi, JP;
Norihiro Ito, Koshi, JP;
Masami Akimoto, Koshi, JP;
Takayuki Toshima, Koshi, JP;
Hiromitsu Nanba, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate and to rotate along with the substrate; a liquid supply mechanism configured to supply a process liquid onto at least a front surface of the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining out of the rotary cup; and a guide member disposed to surround the substrate, having an upper surface to be substantially continued to the front surface of the substrate, and configured to rotate along with the substrate holding member and the rotary cup, such that a process liquid supplied onto the front surface of the substrate and thrown off from the substrate is guided by the upper surface of the guide member from the rotary cup to the exhaust/drain section.