Koshi, Japan

Norihiro Ito

This inventor holds 37 USPTO granted patents and 1 EPO patent, primarily in Liquid Processing. Top assignee: Tokyo Electron Limited. Active years: 2006-2022.


% Patents Active = 81.1


Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 106(Granted Patents)


Location History:

  • Tosu, JP (2006 - 2010)
  • Koshi, JP (2010 - 2021)
  • Kumamoto, JP (2012 - 2022)

Company Filing History:


Years Active: 2006-2022

Loading Chart...
Loading Chart...
Areas of Expertise:
Liquid Processing
Substrate Processing
Treatment Apparatus
Ozone Processing
Cleaning Method
Storage Medium
Liquid Treatment
Substrate Liquid Processing
Processing Method
Nozzle Design
Air Flow Detection
Collection Cup
37 patents (USPTO):Explore Patents

Title: Innovative Contributions of Norihiro Ito in Liquid Processing Technologies

Introduction: Norihiro Ito is an accomplished inventor based in Koshi, Japan, with an impressive portfolio consisting of 37 patents. His work primarily focuses on advancements in liquid processing apparatuses, contributing significantly to the field of semiconductor manufacturing and other industrial applications.

Latest Patents: Among his latest inventions, the liquid processing apparatus stands out. This apparatus features a sophisticated design that includes a holding unit, driving unit, shaft, and nozzle. The driving unit facilitates the rotation of the substrate while the holding unit maintains its horizontal position. The innovative nozzle design incorporates a base attached to the shaft's upper end, extending a liquid supply unit outward to efficiently discharge liquid onto the substrate's lower surface. Furthermore, the design includes a discharge passage that enhances liquid flow toward the substrate efficiently.

Another significant patent by Ito is the substrate processing apparatus, which features a stationary cup body designed to encompass a substrate holding unit. This configuration ensures that the processing liquid or mist is contained effectively, with a mist guard and elevation mechanism to prevent liquid scattering away from the processing area. Such innovative designs reflect Ito's commitment to enhancing operational efficiency and safety in substrate processing.

Career Highlights: Norihiro Ito's professional journey is marked by his tenure at Tokyo Electron Limited, a leading company in semiconductor and electronic manufacturing. His role has been pivotal in fostering innovation within the organization, allowing for the development of cutting-edge technologies that drive the industry forward.

Collaborations: Throughout his career, Ito has collaborated with esteemed colleagues, including Jiro Higashijima and Kazuhiro Aiura. These partnerships highlight the collective effort to push technological boundaries and achieve breakthroughs in substrate processing technology.

Conclusion: Norihiro Ito's contributions to the field of liquid processing are noteworthy, with 37 patents that showcase his inventive spirit and dedication. His work continues to influence the semiconductor industry and related fields, emphasizing the importance of innovation in driving progress and efficiency. As technology evolves, Ito's inventions will likely pave the way for future advancements in liquid processing and manufacturing technologies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…