The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2019

Filed:

Nov. 07, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Terufumi Wakiyama, Koshi, JP;

Norihiro Ito, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/08 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/08 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01); H01L 21/68785 (2013.01); H01L 21/68792 (2013.01); H01L 21/67173 (2013.01);
Abstract

A substrate processing apparatus can suppress a rear surface of a substrate from being contaminated when moving the substrate and a liquid supply unit upwards. When a lift pinand a liquid supply pipeare moved from a neighboring position where they are adjacent to a holding plateto a distanced position, an elevating deviceraises only the lift pinfor a time during which the first lifting memberis moved up to a preset position while being connected to the lift pin. The elevating deviceraises the lift pinand the liquid supply pipefor a time during which the first lifting memberis raised from the preset position to the distanced position.


Find Patent Forward Citations

Loading…