Koshi, Japan

Hiromitsu Nanba

This inventor holds 17 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Substrate Processing. Top assignee: Tokyo Electron Limited. Active years: 2007-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromitsu Nanba. Retrieved from https://idiyas.com/inventor/hiromitsu-nanba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 58.8


Average Co-Inventor Count = 1.9

ph-index = 5

Forward Citations = 74(Granted Patents)


Location History:

  • Tosu, JP (2007 - 2008)
  • Koshi, JP (2010 - 2019)
  • Kumamoto, JP (2013 - 2019)

Company Filing History:


Years Active: 2007-2019

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Areas of Expertise:
Substrate Processing
Wet Etching
Liquid Processing
Cleaning Apparatus
Storage Medium
Substrate Cleaning
Recording Medium
Substrate Method
Processing Apparatus
Drain Cup Cleaning
Liquid Processing Method
Computer Readable
17 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Hiromitsu Nanba

Introduction

Hiromitsu Nanba, hailing from Koshi, Japan, is an influential inventor renowned for his significant contributions in the field of substrate processing technology. With a remarkable portfolio of 17 patents, Nanba has made a substantial impact on the development and optimization of processes essential for modern manufacturing in the semiconductor industry.

Latest Patents

Nanba's latest patents showcase innovative techniques in substrate processing. His patents include a substrate processing apparatus designed to improve the efficiency of substrate manipulation during film treatments. This apparatus features a rotary holding part that securely holds and rotates a substrate, enhancing the uniform application of chemical solutions. Additionally, he developed a method for wet etching that optimizes the etching process by applying both an etching chemical and an inhibiting liquid to ensure precise control and improved outcomes in substrate treatment. These advancements are crucial for enhancing the fabrication processes used in cutting-edge technology.

Career Highlights

Currently working at Tokyo Electron Limited, Nanba's career is marked by his dedication to advancing substrate processing methodologies. Through his innovative spirit and technical expertise, he continues to push the boundaries of what is achievable in semiconductor manufacturing. His extensive work in this field has garnered him recognition and solidified his status as a leading inventor in the industry.

Collaborations

Throughout his career, Nanba has collaborated with esteemed colleagues such as Norihiro Ito and Takehiko Orii. These partnerships foster a creative environment that encourages the exchange of ideas and innovation, further driving advancements in their shared field of expertise.

Conclusion

In conclusion, Hiromitsu Nanba stands as a testament to the power of innovation in technology. His significant contributions to substrate processing not only highlight his dedication as an inventor but also reflect the collaborative spirit that characterizes the field of engineering. As advancements in substrate technology continue to evolve, Nanba's work remains foundational in shaping the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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