The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Apr. 17, 2007
Masami Akimoto, Koshi, JP;
Takayuki Toshima, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Kazuhisa Matsumoto, Koshi, JP;
Norihiro Ito, Koshi, JP;
Hiromitsu Nanba, Koshi, JP;
Masami Akimoto, Koshi, JP;
Takayuki Toshima, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Kazuhisa Matsumoto, Koshi, JP;
Norihiro Ito, Koshi, JP;
Hiromitsu Nanba, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A liquid processing apparatus includes: a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integratedly rotate the rotary cup and the substrate holding member; a liquid supply mechanism configured to supply a process liquid onto the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining of the rotary cup. The exhaust/drain section includes an annular drain cup configured to mainly collect and discharge a process liquid thrown off from the substrate, and an exhaust cup surrounding the drain cup and configured to mainly collect and discharge a gas component from inside and around the rotary cup. Liquid-draining from the drain cup and gas-exhausting from the exhaust cup are performed independently of each other.