The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Jul. 20, 2007
Norihiro Ito, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Hiromitsu Nanba, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A liquid treatment device having a rotatable substrate holding section () for horizontally holding a wafer (W), an annular-shaped rotation cup () which surrounds the wafer (W) which rotates with the wafer (W), a rotation mechanism () for integrally rotating the rotation cup () and the substrate holding section (), a nozzle () for supplying a treatment liquid for the wafer (W) at a treatment position and a cleaning liquid for the rotation cup () at its external surface, a liquid supply section () for the nozzle (), and a nozzle movement mechanism for moving the nozzle () between the wafer treatment position and the external portion of the rotation cup ().