The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Apr. 06, 2010
Merritt Funk, Austin, TX (US);
David V. Horak, Essex Junction, VT (US);
Eric J. Strang, Chandler, AZ (US);
Lee Chen, Cedar Creek, TX (US);
Merritt Funk, Austin, TX (US);
David V. Horak, Essex Junction, VT (US);
Eric J. Strang, Chandler, AZ (US);
Lee Chen, Cedar Creek, TX (US);
Tokyo Electron Limited, Tokyo, JP;
International Business Machines Corporation (“IBM”), Armonk, NY (US);
Abstract
A plasma processing system includes a processing chamber, a substrate holder configured to hold a substrate for plasma processing, and a gas injection assembly. The gas injection assembly includes a first evacuation port located substantially in a center of the gas injection assembly and configured to evacuate gases from a central region of the substrate, and a gas injection system configured to inject gases in the process chamber. The plasma processing system also includes a second evacuation port configured to evacuate gases from a peripheral region surrounding the central region of the substrate.