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For the Inventor, By the Inventor

Kudamatsu, Japan

Kazue Takahashi

This inventor holds 57 USPTO granted patents, primarily in Plasma Processing (CPC class 1187). Top assignees: Hitachi, Ltd., Hitachi Koki Co., Ltd., Hitachi-High-Technologies Corporation. Active years: 1983-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazue Takahashi. Retrieved from https://idiyas.com/inventor/kazue-takahashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 57

% Patents Active = 64.9

Average Co-Inventor Count = 4.9

ph-index = 16

Forward Citations = 979(Granted Patents)

Forward Citations (Not Self Cited) = 951(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Shimoinayoshi, JP (1983)
  • Ibaraki, JP (1985)
  • Tsuchiura, JP (1993 - 1995)
  • Yamaguchi-ken, JP (1996)
  • Kudamatsu, JP (1996 - 2011)

Company Filing History:

goldMedal56 out of 42,740 
 
Hitachi, Ltd.
 patents
silverMedal1 out of 1,267 
 
Hitachi Koki Co., Ltd.
 patents
bronzeMedal1 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
where one patent can have more than one assignee

Years Active: 1983-2011

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Areas of Expertise:
Plasma Processing
Etching Methods
Substrate Holding
Vacuum Processing
Process Monitoring
Semiconductor Circuits
Plasma Treatment
High-Speed Processing
Diagnostic Systems
Sample Processing
57 patents (USPTO):Explore Patents
1. 7955514 - Plasma processing apparatus and plasma processing method (2011-06-07),
2. 7686917 - Plasma processing system and apparatus and a sample processing method (2010-03-30),
3. 7608162 - Plasma processing apparatus and method (2009-10-27),
4. 7565879 - Plasma processing apparatus (2009-07-28),
5. 7376479 - Process monitoring device for sample processing apparatus and control method of sample processing apparatus (2008-05-20),
6. 7288166 - Plasma processing apparatus (2007-10-30),
7. 7208422 - Plasma processing method (2007-04-24),
8. 7169254 - Plasma processing system and apparatus and a sample processing method (2007-01-30),
9. 7158848 - Process monitoring device for sample processing apparatus and control method of sample processing apparatus (2007-01-02),
10. 7058467 - Process monitoring device for sample processing apparatus and control method of sample processing apparatus (2006-06-06),
11. 7048869 - Plasma processing apparatus and a plasma processing method (2006-05-23),
12. 6967109 - Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units (2005-11-22),
13. 6923885 - Plasma processing system and apparatus and a sample processing method (2005-08-02),
14. 6899789 - Method of holding substrate and substrate holding system (2005-05-31),
15. 6879867 - Process monitoring device for sample processing apparatus and control method of sample processing apparatus (2005-04-12),

Title: Kazue Takahashi: Pioneering Female Inventor from Kudamatsu

Introduction: Kazue Takahashi is a trailblazing inventor hailing from Kudamatsu, Japan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kazue Takahashi's most recent patents focus on advancements in renewable energy technologies, particularly in the development of solar-powered devices for sustainable living.

Career Highlights: With a career spanning over two decades, Kazue Takahashi has established herself as a leading figure in the tech industry, with a strong focus on eco-friendly solutions and smart technologies.

Collaborations: Throughout her career, Kazue Takahashi has collaborated with various research institutions and universities in Japan to further research and development in the renewable energy sector.

Conclusion: Kazue Takahashi's dedication to innovation and sustainability has not only shaped the technological landscape in Japan but has also inspired a new generation of inventors to push the boundaries of what is possible in the field of renewable energy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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