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For the Inventor, By the Inventor

Tetsuya Ishikawa

Saratoga, CA, United States of America

Tetsuya Ishikawa

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This inventor holds 108 USPTO granted patents and 21 published patent applications and 1 EPO patent, primarily in Epitaxial Deposition (CPC class 156345). Top assignees: Applied Materials, Inc., Sokudo Co., Ltd., Apple Inc.. Active years: 1994-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuya Ishikawa. Retrieved from https://idiyas.com/inventor/tetsuya-ishikawa-1y4g6z5v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 108 

% Patents Active = 74.1

 

Average Co-Inventor Count = 4.7

ph-index = 36

Forward Citations = 7,253(Granted Patents)

Forward Citations (Not Self Cited) = 6,995(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Funabashi, JP (1994)
  • Chiba, CA (US) (2001)
  • Chiba, JP (1996 - 2003)
  • Santa Clara, CA (US) (1998 - 2009)
  • Saratogo, CA (US) (2011)
  • Saratoga, CA (US) (2003 - 2016)
  • San Jose, CA (US) (2018 - 2024)

Company Filing History:

goldMedal93 out of 14,502 
 
Applied Materials, Inc.
 patents
silverMedal7 out of 58 
 
Sokudo Co., Ltd.
 patents
bronzeMedal5 out of 43,688 
 
Apple Inc.
 patents
4. 3 out of 834,601 
Other
 patents

Years Active: 1994-2026

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Areas of Expertise:
Epitaxial Deposition
Thin Film Batteries
Gas Injector
CVD Chamber
Battery Defects
Silicon Carbide
Cluster Tool Architecture
Group III-Nitride
Plasma Spraying
Thermal Spraying
Magnetic Plasma Control
Dielectric Films
108 patents (USPTO):Explore Patents
1. 12768074 - Chamber architecture for epitaxial deposition and advanced epitaxial film applications (2026-10-20),
2. 12721089 - Multi-zone lamp heating for chemical vapor deposition (2026-08-25),
3. 12698570 - Highly reflective metallic alloys for components of semiconductor processing equipment, and related methods (2026-08-04),
4. 12660554 - Lamp heating module for an epitaxy process chamber (2026-06-16),
5. 12091749 - Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet (2024-09-17),
6. 12060651 - Chamber architecture for epitaxial deposition and advanced epitaxial film applications (2024-08-13),
7. 12018372 - Gas injector for epitaxy and CVD chamber (2024-06-25),
8. 11271210 - Cathode active material with silicon carbide additive (2022-03-08),
9. 11011773 - Devices and methods for reducing battery defects (2021-05-18),
10. 10637093 - Thin film battery structures having sloped cell sidewalls (2020-04-28),
11. 10115994 - Devices and methods for reducing battery defects (2018-10-30),
12. 10020532 - Thin film battery structures having sloped cell sidewalls (2018-07-10),
13. 9431477 - Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE) (2016-08-30),
14. 8664815 - Flywheel energy storage device with a hubless ring-shaped rotor (2014-03-04),
15. 8568529 - HVPE chamber hardware (2013-10-29),

Title: Unveiling the Innovations of Inventor Tetsuya Ishikawa

Introduction:

In the realm of technological advancements, inventors play a pivotal role in shaping the landscape of innovation. One such visionary is Tetsuya Ishikawa, a prolific inventor based in Saratoga, CA (US), who has made significant contributions to the field of semiconductor processing and lithium battery technology.

Latest Patents:

Tetsuya Ishikawa's latest patents showcase his expertise in cutting-edge technologies. One notable patent is the "Gas injector for epitaxy and CVD chamber," which revolutionizes the process of semiconductor substrate processing by employing advanced gas inject apparatus. Another groundbreaking patent is the "Cathode active material with silicon carbide additive," which enhances lithium battery performance through the incorporation of silicon carbide additives.

Career Highlights:

With an impressive portfolio of 102 patents to his name, Tetsuya Ishikawa has established himself as a trailblazer in the field of innovation. His tenure at renowned companies such as Applied Materials, Inc. and Sokudo Co., Ltd. has been marked by groundbreaking discoveries and technological advancements that have pushed the boundaries of traditional practices.

Collaborations:

Collaboration is key to driving innovation, and Tetsuya Ishikawa has had the privilege of working alongside esteemed colleagues such as Jay D Pinson, II and David H Quach. Together, they have spearheaded projects that have garnered recognition in the industry and have paved the way for future advancements.

Conclusion:

Inventor Tetsuya Ishikawa's relentless pursuit of innovation and passion for technological advancement have cemented his legacy as a visionary inventor. His groundbreaking patents and successful collaborations underscore his commitment to shaping the future of technology and inspire aspiring inventors to push boundaries and redefine what is possible in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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