logo

For the Inventor, By the Inventor

San Jose, CA, United States of America

Peter K Loewenhardt

This inventor holds 59 USPTO granted patents and 5 EPO patents, primarily in Plasma Processing (CPC class H05H). Top assignees: Applied Materials, Inc., Lam Research Corporation. Active years: 1995-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter K Loewenhardt. Retrieved from https://idiyas.com/inventor/peter-k-loewenhardt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 59

% Patents Active = 74.6


Average Co-Inventor Count = 4.3

ph-index = 22

Forward Citations = 1,973(Granted Patents)

Forward Citations (Not Self Cited) = 1,947(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Campbell, CA (US) (1995 - 1996)
  • Santa Clara, CA (US) (1998 - 2001)
  • Sant Jose, CA (US) (2001 - 2002)
  • San Jose, CA (US) (1998 - 2008)
  • Pleasanton, CA (US) (2002 - 2014)

Company Filing History:

goldMedal37 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal22 out of 3,953 
 
Lam Research Corporation
 patents

Years Active: 1995-2014

Loading Chart...
Loading Chart...
Areas of Expertise:
Plasma Processing
Etch Systems
RF Pulsing
Semiconductor Substrate
Multi-Part Electrode
Corrosion Prevention
Wafer Cleaning
Sputtering
Magnetically Enhanced Plasma
Temperature Control
Gas Distribution
Line Edge Roughness
59 patents (USPTO):Explore Patents
1. 8801892 - Uniform etch system (2014-08-12),
2. 8573153 - Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode (2013-11-05),
3. 8430970 - Methods for preventing corrosion of plasma-exposed yttria-coated constituents (2013-04-30),
4. 8337713 - Methods for RF pulsing of a narrow gap capacitively coupled reactor (2012-12-25),
5. 7976673 - RF pulsing of a narrow gap capacitively coupled reactor (2011-07-12),
6. 7861667 - Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode (2011-01-04),
7. 7601246 - Methods of sputtering a protective coating on a semiconductor substrate (2009-10-13),
8. 7597816 - Wafer bevel polymer removal (2009-10-06),
9. 7385287 - Preventing damage to low-k materials during resist stripping (2008-06-10),
10. 7371332 - Uniform etch system (2008-05-13),
11. 7363876 - Multi-core transformer plasma source (2008-04-29),
12. 7294580 - Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition (2007-11-13),
13. 7244336 - Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift (2007-07-17),
14. 7226852 - Preventing damage to low-k materials during resist stripping (2007-06-05),
15. 7211518 - Waferless automatic cleaning after barrier removal (2007-05-01),

Title: Peter K Loewenhardt - Pioneering Innovations in Semiconductor Processing

Introduction:

Peter K Loewenhardt, a distinguished inventor based in San Jose, CA, has made significant contributions to the field of semiconductor processing. With an impressive portfolio of 59 patents, his groundbreaking work has revolutionized the industry.

Latest Patents:

1. Uniform etch system: Loewenhardt's patent introduces a novel method for etching a layer over a substrate in a plasma processing chamber. By simultaneously generating plasmas from different gases, this system enhances the efficiency and precision of the etching process.

2. Multi-part electrode for a semiconductor processing plasma reactor: This patent showcases Loewenhardt's innovative approach to electrode design. The replaceable central portion of the electrode minimizes wear and maximizes longevity, making it a valuable asset in semiconductor processing systems.

Career Highlights:

Peter K Loewenhardt has been instrumental in driving innovation at leading companies such as Applied Materials, Inc. and Lam Research Corporation. His expertise and inventive spirit have propelled these organizations to new heights in semiconductor technology.

Collaborations:

Throughout his career, Loewenhardt has collaborated with esteemed colleagues such as Gerald Z Yin and Diana Xiaobing Ma. Their collective efforts have resulted in cutting-edge solutions that have reshaped the semiconductor landscape.

Conclusion:

In conclusion, Peter K Loewenhardt stands as a trailblazer in the world of semiconductor processing, with a remarkable track record of innovation and ingenuity. His patents and collaborations underscore his commitment to advancing technology and pushing the boundaries of what is possible in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…