The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2008

Filed:

Jan. 30, 2004
Applicants:

Canfeng Lai, Fremont, CA (US);

Michael S. Cox, Davenport, CA (US);

Peter K. Loewenhardt, San Jose, CA (US);

Tsutomu Tanaka, Santa Clara, CA (US);

Shamouil Shamouilian, San Jose, CA (US);

Inventors:

Canfeng Lai, Fremont, CA (US);

Michael S. Cox, Davenport, CA (US);

Peter K. Loewenhardt, San Jose, CA (US);

Tsutomu Tanaka, Santa Clara, CA (US);

Shamouil Shamouilian, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
Abstract

A transformer-coupled plasma source using toroidal cores forms a plasma with a high-density of ions along the center axis of the torus. In one embodiment, cores of a plasma generator are stacked in a vertical alignment to enhance the directionality of the plasma and generation efficiency. In another embodiment, cores are arranged in a lateral array into a plasma generating plate that can be scaled to accommodate substrates of various sizes, including very large substrates. The symmetry of the plasma attained allows simultaneous processing of two substrates, one on either side of the plasma generator.


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