Shamouil Shamouilian

Title: The Innovative Contributions of Shamouil Shamouilian

Introduction

Shamouil Shamouilian, based in San Jose, CA, is a prolific inventor known for his significant contributions to the field of plasma technology and deposition processes. With an impressive portfolio of 67 patents, Shamouilian has established himself as a leading figure among innovators in his domain, driving advancements in semiconductor manufacturing and materials science.

Latest Patents

Shamouilian’s latest patents include groundbreaking technologies that enhance the effectiveness and efficiency of plasma processes. One of his notable inventions is titled "In situ application of etch back for improved deposition into high-aspect-ratio features." This patent describes a continuous in situ process that combines deposition, etching, and deposition to create a uniform film on a substrate using a plasma process. This innovative technique permits the filling of features with high aspect ratios while maintaining process continuity for improved uniformity.

Another significant patent is the "Multi-core transformer plasma source," which details a transformer-coupled plasma source employing toroidal cores. This design generates a plasma with a high density of ions along the center axis of the torus. By stacking cores of a plasma generator vertically or arranging them laterally into a plasma-generating plate, the technology allows for scalable processing of substrates, including very large ones. The symmetry of the plasma also enables simultaneous processing of two substrates, enhancing overall operational efficiency.

Career Highlights

Throughout his career, Shamouil Shamouilian has made substantial contributions while working in prestigious companies like Applied Materials, Inc. His expertise and innovative mindset have led to numerous advancements in the semiconductor industry, particularly in plasma applications for material deposition and etching.

Collaborations

Shamouilian has collaborated with esteemed colleagues, including Ananda H. Kumar and Arnold Kholodenko. These collaborations have fostered knowledge sharing and the fusion of ideas, further enhancing the potential for innovative solutions in their field.

Conclusion

Shamouil Shamouilian continues to be a vital contributor to the world of innovations in plasma technology. His extensive portfolio of patents not only reflects his depth of knowledge and creativity but also underscores the importance of collaboration in advancing technology. As he progresses in his career, the impact of his work will likely resonate throughout the industry for years to come.