The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Jul. 28, 1999
Applicant:
Inventors:
Shamouil Shamouilian, San Jose, CA (US);
Tony S. Kaushal, Cupertino, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 1/908 ; A62D 3/00 ;
U.S. Cl.
CPC ...
B01J 1/908 ; A62D 3/00 ;
Abstract
An apparatus and method for reducing hazardous gases exhausted from a process chamber includes an effluent plasma reactor and a downstream catalytic reactor . The reactor may include a consumable liner that reacts with the energized effluent to remove the hazardous gases. The catalytic reactor may also include catalytic surfaces in a honeycomb, foam, or pellet structure to catalyze reactions that further reduce hazardous gas content.