The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2011
Filed:
May. 23, 2003
Andreas Fischer, Castro Valley, CA (US);
William S. Kennedy, Fremont, CA (US);
Peter Loewenhardt, Pleasanton, CA (US);
David Trussell, Fremont, CA (US);
Andreas Fischer, Castro Valley, CA (US);
William S. Kennedy, Fremont, CA (US);
Peter Loewenhardt, Pleasanton, CA (US);
David Trussell, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An improved upper electrode system has a multi-part electrode in which a central portion of the electrode having high wear is replaceable independent of an outer peripheral portion of the electrode. The upper electrode can be used in plasma processing systems for processing semiconductor substrates, such as by etching or CVD. The multi-part upper electrode system is particularly useful for large size wafer processing chambers, such as 300 mm wafer processing chambers for which monolithic electrodes are unavailable or costly.