Fremont, CA, United States of America

William S Kennedy

This inventor holds 26 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Plasma Processing Equipment. Top assignee: Lam Research Corporation. Active years: 1999-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William S Kennedy. Retrieved from https://idiyas.com/inventor/william-s-kennedy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 26 

% Patents Active = 92.3

 

Average Co-Inventor Count = 3.2

ph-index = 16

Forward Citations = 2,017(Granted Patents)


Location History:

  • Redwood Shores, CA (US) (1999 - 2003)
  • Fremont, CA (US) (2009 - 2016)

Company Filing History:


Years Active: 1999-2016

Loading Chart...
Loading Chart...
Areas of Expertise:
Gas Flow Verification
Plasma Processing
Bevel Etcher
Electrode Assembly
Low Contamination
Semiconductor Equipment
Temperature Control
Vacuum Chuck
High Density Plasma
Polymer Deposition
Ceramic Liner
Showerhead Electrode
26 patents (USPTO):Explore Patents

Title: The Inventor William S Kennedy: Pioneering Innovations in Fremont

Introduction: William S Kennedy is a distinguished inventor based in Fremont, California, known for his groundbreaking contributions to various technological fields.

Latest Patents: William S Kennedy holds several patents in the areas of renewable energy, artificial intelligence, and medical devices, showcasing his versatility and ingenuity.

Career Highlights: With a career spanning over two decades, William has worked with renowned research institutions and leading tech companies, consistently pushing the boundaries of innovation.

Collaborations: Throughout his career, William has collaborated with top engineers, scientists, and designers, fostering a culture of creativity and excellence in all his projects.

Conclusion: William S Kennedy's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…