The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Jan. 26, 2007
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Alan M. Schoepp, Ben Lomond, CA (US);
Gregory Sexton, Fremont, CA (US);
Yunsang Kim, Monte Sereno, CA (US);
William S. Kennedy, Fremont, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Alan M. Schoepp, Ben Lomond, CA (US);
Gregory Sexton, Fremont, CA (US);
Yunsang Kim, Monte Sereno, CA (US);
William S. Kennedy, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A device for cleaning a bevel edge of a semiconductor substrate. The device includes: a lower support having a cylindrical top portion; a lower plasma-exclusion-zone (PEZ) ring surrounding the outer edge of the top portion and adapted to support the substrate; an upper dielectric component opposing the lower support and having a cylindrical bottom portion; an upper PEZ ring surrounding the outer edge of the bottom portion and opposing the lower PEZ ring; and at least one radiofrequency (RF) power source operative to energize process gas into plasma in an annular space defined by the upper and lower PEZ rings, wherein the annular space encloses the bevel edge.