Pleasanton, CA, United States of America

Andrew D Bailey, Iii

USPTO Granted Patents = 134 

Average Co-Inventor Count = 3.1

ph-index = 19

Forward Citations = 2,686(Granted Patents)

DiyaCoin DiyaCoin 3.17 


Inventors with similar research interests:


Location History:

  • Fremont, CA (US) (2016)
  • Pleansanton, CA (US) (2019)
  • San Jose, CA (US) (2017 - 2020)
  • Pleasanton, CA (US) (2001 - 2023)
  • Milpitas, CA (US) (2018 - 2023)

Company Filing History:


Years Active: 2001-2023

where 'Filed Patents' based on already Granted Patents

134 patents (USPTO):

Title: Andrew D Bailey III: A Maverick Inventor Shaping Semiconductor Technologies

Introduction:

Andrew D Bailey III, a resident of Pleasanton, California, is an acclaimed inventor with an impressive track record in the field of semiconductor device fabrication. With a staggering 134 patents to his name, Bailey has made significant contributions to the industry. This article will delve into Bailey's latest patents, key career highlights, notable collaborations, and his invaluable contributions to the field of semiconductor technology.

Latest Patents:

Bailey's recent patents showcase his expertise in optimizing process simulation models and developing advanced plasma chamber configurations.

1. Method of etch model calibration using optical scatterometry:

This patent describes computer-implemented methods for optimizing process simulation models used in semiconductor device fabrication operations. Bailey's innovative approach involves generating cost values with the help of a computationally predicted result, combined with metrology results obtained from a reaction chamber. The calibration process enhances precision and efficiency, particularly in the realm of optical scatterometry.

2. Pulsed plasma chamber in dual-chamber configuration:

In this patent, Bailey introduces a novel apparatus for substrate processing in a pulsed plasma chamber. The invention includes two chambers, separated by a plate, which facilitates the flow of species between them. With comprehensive control mechanisms, including continuous wave and pulsed radio frequency power sources, this configuration allows for effective negative-ion etching, neutralization of positive charge during afterglow, and re-striking of the bottom plasma. This technology promises enhanced efficiency and yield in semiconductor manufacturing.

Career Highlights:

Andrew D Bailey III has harnessed his technical prowess and visionary thinking during his career, contributing significantly to Lam Research Corporation and Lam Corporation. Through his tenure at these esteemed organizations, he has spearheaded advancements in semiconductor manufacturing processes and equipment.

Collaborations:

Bailey's dedication to innovation has led him to collaborate with industry experts, further amplifying the impact of his inventions. Notably, he has worked alongside Yunsang Kim and Andras Kuthi, both prominent figures in the semiconductor field. These collaborations have fostered an environment of knowledge-sharing and have fueled groundbreaking developments.

Conclusion:

Andrew D Bailey III's prolific career and extensive patent portfolio highlight his commitment to pushing the boundaries of semiconductor technology. His expertise in process optimization and chamber configurations has set new standards in the industry. Bailey's collaboration with renowned experts has further strengthened his contributions and cemented his reputation as a trailblazer. His inventive spirit continues to inspire and shape the future of innovation in the semiconductor domain.

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