The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Apr. 03, 2012
Ryan Bise, San Jose, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Alexei Marakhtanov, San Jose, CA (US);
Lumin LI, San Jose, CA (US);
Sang Ki Nam, San Jose, CA (US);
Jim Rogers, San Jose, CA (US);
Eric Hudson, San Jose, CA (US);
Gerardo Delgadino, San Jose, CA (US);
Andrew D. Bailey, Iii, San Jose, CA (US);
Mike Kellogg, San Jose, CA (US);
Anthony Dela Llera, San Jose, CA (US);
Darrell Ehrlich, San Jose, CA (US);
Ryan Bise, San Jose, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Alexei Marakhtanov, San Jose, CA (US);
Lumin Li, San Jose, CA (US);
Sang Ki Nam, San Jose, CA (US);
Jim Rogers, San Jose, CA (US);
Eric Hudson, San Jose, CA (US);
Gerardo Delgadino, San Jose, CA (US);
Andrew D. Bailey, III, San Jose, CA (US);
Mike Kellogg, San Jose, CA (US);
Anthony Dela Llera, San Jose, CA (US);
Darrell Ehrlich, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A system and method of plasma processing includes a plasma processing system including a plasma chamber and a controller coupled to the plasma chamber. The plasma chamber including a substrate support and an upper electrode opposite the substrate support, the upper electrode having a plurality of concentric gas injection zones.