San Jose, CA, United States of America

Darrell Ehrlich

This inventor holds 19 USPTO granted patents and 13 published patent applications and 1 EPO patent, primarily in Semiconductor Processing. Top assignee: Lam Research Corporation. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Darrell Ehrlich. Retrieved from https://idiyas.com/inventor/darrell-ehrlich

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 84.2

 

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2015-2026

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Areas of Expertise:
Substrate Processing
Plasma Processing
Edge Rings
Electrostatic Chuck
Gas Injection
Temperature Measurement
Anodization
Cooling Channels
Showerhead Electrode
Laminated Heaters
Kinematic Coupling
Protective Surfaces
19 patents (USPTO):Explore Patents

Title: **Darrell Ehrlich: Innovating Plasma Processing Technologies**

Introduction

Darrell Ehrlich, an accomplished inventor based in San Jose, CA, has made significant contributions to the field of plasma processing technology. With a total of 12 patents to his name, he continues to push the boundaries of innovation in this specialized area.

Latest Patents

Among his latest inventions are two noteworthy patents that enhance the efficiency and functionality of electrostatic chucks used in plasma processing chambers. The first is an "Electrostatic Chuck System for a Plasma Processing Chamber," which features a base plate made of aluminum-silicon carbide (Al—SiC) and includes a ceramic plate bonded to the base plate for improved performance. The second patent, titled "Electrostatic Chuck with Ceramic Monolithic Body," introduces a monolithic ceramic structure equipped with multiple electrodes for managing chucking signals. This design also integrates gas channels and coolant channels to optimize temperature control during substrate processing.

Career Highlights

Darrell Ehrlich currently serves as a valuable member of Lam Research Corporation, where he collaborates with a talented team to innovate advanced technologies in semiconductor manufacturing. His work significantly contributes to the company's mission of providing cutting-edge solutions for the processing of semiconductor materials.

Collaborations

In his career, Darrell has had the opportunity to work alongside skilled colleagues such as Eric A Pape and Daniel Arthur Brown. Together, they share knowledge and expertise, fostering an environment of creativity and collaborative innovation within the company.

Conclusion

Darrell Ehrlich's dedication to advancing plasma processing technology is evident through his impressive portfolio of patents and collaborative efforts at Lam Research Corporation. His innovative contributions continue to shape the landscape of semiconductor manufacturing, reflecting the impact of skilled inventors in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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