Alexei Marakhtanov

Albany, CA, United States of America

Alexei Marakhtanov

This inventor holds 108 USPTO granted patents and 37 published patent applications and 3 EPO patents, primarily in Plasma Processing (CPC class H01J37-32183). Top assignees: Lam Research Corporation, Mks Instruments, Inc.. Active years: 2005-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexei Marakhtanov. Retrieved from https://idiyas.com/inventor/alexei-marakhtanov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 108 

% Patents Active = 96.3

 

Average Co-Inventor Count = 4.0

ph-index = 16

Forward Citations = 1,182(Granted Patents)

Forward Citations (Not Self Cited) = 977(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Albany, NY (US) (2018)
  • Fremont, CA (US) (2013 - 2019)
  • San Jose, CA (US) (2014 - 2020)
  • Albany, CA (US) (2005 - 2024)

Company Filing History:


Years Active: 2005-2026

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Areas of Expertise:
Plasma Processing
RF Power Delivery
Plasma Uniformity
Ion Energy Control
Electrostatic Chuck
Tunable Edge Sheath
Dielectric Etch
Impedance Match
Multi Zone Gas Injection
Radial Etch Uniformity
Pulsed Plasma Chamber
Harmonic Mixing
108 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Alexei Marakhtanov

Introduction

Alexei Marakhtanov is a prominent inventor based in Albany, CA (US), known for his significant contributions to the field of plasma processing systems. With an impressive portfolio of 108 patents, Marakhtanov has made substantial advancements in semiconductor fabrication technologies.

Latest Patents

Among his latest patents is a "Radiofrequency signal filter arrangement for plasma processing system." This invention features a tunable edge sheath (TES) system that includes a coupling ring designed to couple to the bottom surface of an edge ring surrounding a wafer support area within a plasma processing chamber. The TES system incorporates an annular-shaped electrode embedded within the coupling ring, along with multiple radiofrequency signal supply pins connected to the electrode. Each pin extends through a corresponding hole in the coupling ring, and the system includes radiofrequency signal filters that provide high impedance to signals used for plasma generation.

Another notable patent is focused on "Methods and systems for managing byproduct material accumulation during plasma-based semiconductor wafer fabrication process." This invention supports a wafer on a structure that allows for a lower peripheral open region, which is crucial for controlling byproduct material accumulation during plasma generation. By supplying a byproduct volatizing gas to this region, the invention effectively prevents electrical arcing and particle contamination.

Career Highlights

Throughout his career, Marakhtanov has worked with leading companies in the industry, including Lam Research Corporation and MKS Instruments, Inc. His work has been instrumental in enhancing the efficiency and reliability of plasma processing technologies.

Collaborations

Marakhtanov has collaborated with notable professionals in the field, including Rajinder Dhindsa and John Patrick Holland. These collaborations have further enriched his innovative contributions to semiconductor technology.

Conclusion

Alexei Marakhtanov's extensive patent portfolio and innovative inventions have significantly impacted the semiconductor industry. His work continues to pave the way for advancements in plasma processing systems, showcasing his dedication to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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