The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Sep. 21, 2015
Lam Research Corporation, Fremont, CA (US);
Marcus Musselman, Oakland, CA (US);
Juan Valdivia, III, Fremont, CA (US);
Hua Xiang, Pleasanton, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Yoko Yamaguchi, Union City, CA (US);
Qian Fu, Pleasanton, CA (US);
Aaron Eppler, Fremont, CA (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A system for controlling a condition of a wafer processing chamber is disclosed. According the principles of the present disclosure, the system includes memory and a first controller. The memory stores a plurality of profiles of respective ones of a plurality of first control elements. The plurality of first control elements are arranged throughout the chamber. The first controller determines non-uniformities in a substrate processing parameter associated with the plurality of first control elements. The substrate processing parameter is different than the condition of the chamber. The first controller adjusts at least one of the plurality of profiles based on the non-uniformities in the substrate processing parameter and a sensitivity of the substrate processing parameter to the condition.