The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2024
Filed:
May. 11, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Tetsuya Ishikawa, San Jose, CA (US);
Swaminathan T. Srinivasan, Pleasanton, CA (US);
Matthias Bauer, Sunnyvale, CA (US);
Ala Moradian, Sunnyvale, CA (US);
Manjunath Subbanna, Bangalore, IN;
Kartik Bhupendra Shah, Saratoga, CA (US);
Errol Antonio C. Sanchez, Tracy, CA (US);
Sohrab Zokaei, Los Altos, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Peter Reimer, Los Altos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present disclosure generally relates to gas inject apparatus for a process chamber for processing of semiconductor substrates. The gas inject apparatus include one or more gas injectors which are configured to be coupled to the process chamber. Each of the gas injectors are configured to receive a process gas and distribute the process gas across one or more gas outlets. The gas injectors include a plurality of pathways, a fin array, and a baffle array. The gas injectors are individually heated. A gas mixture assembly is also utilized to control the concentration of process gases flown into a process volume from each of the gas injectors. The gas mixture assembly enables the concentration as well as the flow rate of the process gases to be controlled.