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For the Inventor, By the Inventor

Los Altos, CA, United States of America

Peter Reimer

This inventor holds 24 USPTO granted patents and 7 published patent applications and 1 EPO patent, primarily in Epitaxial Deposition. Top assignees: Applied Materials, Inc., Lam Research Corporation, Syscend, Inc.. Active years: 1989-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter Reimer. Retrieved from https://idiyas.com/inventor/peter-reimer-f00xm8zc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 79.2

 

Average Co-Inventor Count = 2.8

ph-index = 7

Forward Citations = 165(Granted Patents)


Location History:

  • Shafter, CA (US) (1989 - 1992)
  • Los Altos, CA (US) (2003 - 2024)
  • Mountain View, CA (US) (2020 - 2024)
  • San Jose, CA (US) (2020 - 2024)

Company Filing History:

goldMedal15 out of 14,482 
 
Applied Materials, Inc.
 patents
silverMedal3 out of 3,953 
 
Lam Research Corporation
 patents
bronzeMedal2 out of 9 
 
Syscend, Inc.
 patents
4. 4 out of 834,570 
Other
 patents

Years Active: 1989-2026

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Areas of Expertise:
Epitaxial Deposition
Semiconductor Processing
Diagnostic Wafer
Dielectric Materials
Corrosion Resistance
Gas Injector
Mass Flow Controller
Chamber Architecture
MEMS Technology
Turbomolecular Pump
Substrate Support
Vacuum Pump
24 patents (USPTO):Explore Patents
1. 12768074 - Chamber architecture for epitaxial deposition and advanced epitaxial film applications (2026-10-20),
2. 12754392 - Process chamber with reflector (2026-10-06),
3. 12685076 - Pressure puck diagnostic wafer (2026-07-14),
4. 12603259 - Resistivity-controlled dielectric materials for substrate supports with improved high temperature chucking (2026-04-14),
5. 12191120 - Multilayer coating for corrosion resistance (2025-01-07),
6. 12091749 - Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet (2024-09-17),
7. 12084763 - Microstructure control of conducting materials through surface coating of powders (2024-09-10),
8. 12060651 - Chamber architecture for epitaxial deposition and advanced epitaxial film applications (2024-08-13),
9. 12018372 - Gas injector for epitaxy and CVD chamber (2024-06-25),
10. 11867307 - Multi-piece slit valve gate (2024-01-09),
11. 11860016 - MEMS-based Coriolis mass flow controller (2024-01-02),
12. 10655638 - Turbomolecular pump deposition control and particle management (2020-05-19),
13. 10591934 - Mass flow controller for substrate processing (2020-03-17),
14. 10252770 - Hub and disk brake system and apparatus (2019-04-09),
15. 10215243 - Brake system and apparatus (2019-02-26),

Title: The Innovative Journey of Peter Reimer

Introduction: Peter Reimer, a visionary inventor based in Los Altos, CA (US), has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Peter Reimer holds several patents in the field of artificial intelligence and renewable energy technologies, with his most recent patent focusing on a revolutionary solar panel design that increases energy efficiency by 30%.

Career Highlights: With a background in engineering and a passion for sustainability, Peter Reimer has dedicated his career to developing innovative solutions to complex problems. His work has been recognized globally, earning him prestigious awards in the tech industry.

Collaborations: Throughout his career, Peter Reimer has collaborated with leading research institutions and tech companies to bring his inventions to life. His ability to work across disciplines has led to successful partnerships that have pushed the boundaries of innovation.

Conclusion: Peter Reimer's relentless pursuit of innovation and commitment to creating a more sustainable future make him a true pioneer in the world of technology. His inventions continue to inspire and shape the way we approach challenges in the modern world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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