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For the Inventor, By the Inventor

Pleasanton, CA, United States of America

Swaminathan T Srinivasan

This inventor holds 32 USPTO granted patents and 23 published patent applications, primarily in Epitaxial Deposition. Top assignees: Applied Materials, Inc., Micro Materials Inc.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Swaminathan T Srinivasan. Retrieved from https://idiyas.com/inventor/swaminathan-t-srinivasan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 68.8

Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 52(Granted Patents)


Location History:

  • Pleaseanton, CA (US) (2017)
  • Pleasanton, CA (US) (2014 - 2024)

Company Filing History:

goldMedal30 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal2 out of 27 
 
Micro Materials Inc.
 patents

Years Active: 2014-2026

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Areas of Expertise:
Epitaxy
Semiconductors
High-Density Processing
Gas Injector
Selective Deposition
Additive Manufacturing
Temperature Control
Threshold Voltage
32 patents (USPTO):Explore Patents
1. 12660554 - Lamp heating module for an epitaxy process chamber (2026-06-16),
2. 12221694 - Conditioning of a processing chamber (2025-02-11),
3. 12091749 - Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet (2024-09-17),
4. 12074042 - High-density substrate processing systems and methods (2024-08-27),
5. 12060651 - Chamber architecture for epitaxial deposition and advanced epitaxial film applications (2024-08-13),
6. 12018372 - Gas injector for epitaxy and CVD chamber (2024-06-25),
7. 11978635 - Silicide films through selective deposition (2024-05-07),
8. 11705335 - Conformal high concentration boron doping of semiconductors (2023-07-18),
9. 11574826 - High-density substrate processing systems and methods (2023-02-07),
10. 11446740 - Multiple sequential linear powder dispensers for additive manufacturing (2022-09-20),
11. 11328928 - Conformal high concentration boron doping of semiconductors (2022-05-10),
12. 11037825 - Selective removal process to create high aspect ratio fully self-aligned via (2021-06-15),
13. 10950450 - Silicide films through selective deposition (2021-03-16),
14. 10910238 - Heater pedestal assembly for wide range temperature control (2021-02-02),
15. 10790191 - Selective removal process to create high aspect ratio fully self-aligned via (2020-09-29),

Title: Innovations and Contributions of Swaminathan T Srinivasan

Introduction

Swaminathan T Srinivasan is a prolific inventor based in Pleasanton, California, known for his significant contributions to materials science and substrate processing technologies. With an impressive portfolio of 30 patents, Srinivasan has established himself as a leader in the field of epitaxial deposition and high-density substrate processing systems.

Latest Patents

Among his recent innovations is a method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet. This method involves the flow of a purge gas from a lower gas inlet, maintaining specific pressure conditions in the chamber regions to optimize the deposition process. Additionally, he has developed high-density substrate processing systems that include advanced features such as a factory interface, load locks, and a transfer chamber equipped with robotic systems designed to enhance substrate handling and processing efficiency.

Career Highlights

Srinivasan has had a robust career, working at renowned companies such as Applied Materials, Inc. and Micro Materials Inc. His work has significantly advanced the capabilities of equipment used in semiconductor manufacturing and related industries, making him a notable figure among his peers.

Collaborations

Throughout his career, Srinivasan has collaborated with talented individuals, including Joseph Michael Ranish and Errol Antonio C Sanchez. These collaborations have contributed to advancements in technology and the successful development of novel patentable ideas.

Conclusion

Swaminathan T Srinivasan's remarkable achievements in the field of epitaxial deposition and substrate processing highlight his innovative spirit and dedication to advancing technology. His extensive patent portfolio not only showcases his inventiveness but also illustrates the impact of his work on the semiconductor industry and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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