The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Aug. 25, 2020
Applicant:
Micromaterials Llc, Wilmington, DE (US);
Inventors:
Amrita B. Mullick, Santa Clara, CA (US);
Madhur Sachan, Belmont, CA (US);
He Ren, San Jose, CA (US);
Swaminathan Srinivasan, Pleasanton, CA (US);
Regina Freed, Los Altos, CA (US);
Uday Mitra, Cupertino, CA (US);
Assignee:
Micromaterials LLC, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76897 (2013.01); H01L 21/31111 (2013.01); H01L 21/7681 (2013.01); H01L 21/76813 (2013.01); H01L 21/76819 (2013.01); H01L 21/76877 (2013.01); H01L 23/5226 (2013.01);
Abstract
Apparatuses and methods to provide a fully self-aligned via are described. Some embodiments of the disclosure utilize a cap layer to protect an insulating layer in order to minimize bowing of the side walls during metal recess in a fully self-aligned via. The cap layer can be selectively removed, thus increasing the aspect ratio, by exposing the substrate to a hot phosphoric acid solution.