He Ren

This inventor holds 64 USPTO granted patents and 19 published patent applications and 2 EPO patents, primarily in Semiconductor Processing (CPC class H01L). Top assignees: Applied Materials, Inc., Micro Materials Inc., Applied Material, Inc.. Active years: 2015-2026.

USPTO Granted Patents = 64 (Patent Applications = 19)

% Patents Active = 90.6

EPO Patents = 2 (Patent Applications = 5)

Average Co-Inventor Count = 5.1

ph-index = 9

Forward Citations = 509(Granted Patents)

Forward Citations (Not Self Cited) = 489(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

57 out of 14,391

Applied Materials, Inc.

Applied Material, Inc.

Years Active: 2015-2026

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Areas of Expertise:

Dielectric Material Fill

Selective Metal Deposition

Interconnect Structures

Self-Aligned Vias

Tungsten ALD

Nickel Silicide

Subtractive Techniques

Selective Etch

Barrier-Liner Recess

Multi-Step Pre-Clean

High Aspect Ratio

Electronic Devices

64 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12543547 - Method of dielectric material fill and treatment (2026-02-03),

2. 12062545 - Fluorine-free tungsten ALD for dielectric selectivity improvement (2024-08-13),

3. 12046508 - Method of dielectric material fill and treatment (2024-07-23),

4. 12002705 - Methods and apparatus for forming backside power rails (2024-06-04),

5. 11967527 - Fully aligned subtractive processes and electronic devices therefrom (2024-04-23),

6. 11965236 - Method of forming nickel silicide materials (2024-04-23),

7. 11955382 - Reverse selective etch stop layer (2024-04-09),

8. 11923244 - Subtractive metals and subtractive metal semiconductor structures (2024-03-05),

9. 11908696 - Methods and devices for subtractive self-alignment (2024-02-20),

10. 11830725 - Method of cleaning a structure and method of depositing a capping layer in a structure (2023-11-28),

11. 11776806 - Multi-step pre-clean for selective metal gap fill (2023-10-03),

12. 11749532 - Methods and apparatus for processing a substrate (2023-09-05),

13. 11705366 - Methods for controllable metal and barrier-liner recess (2023-07-18),

14. 11615984 - Method of dielectric material fill and treatment (2023-03-28),

15. 11515200 - Selective tungsten deposition within trench structures (2022-11-29),

Certainly! Here is the article about the inventor He Ren:

Title: Unveiling the Innovations of Inventor He Ren from San Jose, CA

Introduction:

He Ren, a distinguished inventor based in San Jose, California, has made significant contributions to the field of electronic devices with an impressive portfolio of 60 patents. His career has been marked by a relentless pursuit of excellence in inventing cutting-edge solutions for complex technological challenges.

Latest Patents:

1. Fully aligned subtractive processes and electronic devices therefrom: He Ren's innovative method involves forming fully aligned vias connecting two metal lines in multiple directions, enhancing the efficiency of electronic devices' interconnectivity.

2. Method of forming nickel silicide materials: Ren's groundbreaking technique for forming nickel silicide material on substrates showcases his proficiency in materials science and semiconductor manufacturing.

Career Highlights:

Recognized for his expertise, He Ren has lent his creative genius to renowned companies including Applied Materials, Inc. and Micro Materials Inc. His tenure at these organizations has been instrumental in shaping the landscape of semiconductor technologies.

Collaborations:

Throughout his career, He Ren has collaboratively worked with exceptional professionals such as Mehul B Naik and Hao Jiang. These partnerships underscore his commitment to fostering innovation through teamwork and shared knowledge.

Conclusion:

Inventor He Ren's remarkable journey in the realm of inventions and patents stands as a testament to his unwavering dedication to advancing electronic devices' capabilities. His ingenious solutions and collaborative spirit continue to inspire the next generation of innovators in the ever-evolving tech industry.