The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Jan. 20, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Naomi Yoshida, Sunnyvale, CA (US);

He Ren, San Jose, CA (US);

Hao Jiang, San Jose, CA (US);

Chenfei Shen, San Jose, CA (US);

Chi-Chou Lin, San Jose, CA (US);

Hao Chen, Santa Clara, CA (US);

Xuesong Lu, Santa Clara, CA (US);

Mehul B. Naik, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/28 (2006.01); B08B 5/02 (2006.01); H01L 29/66 (2006.01); H01L 21/3205 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B08B 5/02 (2013.01); H01L 21/28026 (2013.01); H01L 21/32051 (2013.01); H01L 29/66795 (2013.01);
Abstract

Embodiments of the present disclosure generally relate to methods of cleaning a structure and methods of depositing a capping layer in a structure. The method of cleaning a structure includes suppling a cleaning gas, including a first gas including nitrogen (N) and a second gas including fluorine (F), to a bottom surface of a structure. The cleaning gas removes unwanted metal oxide and etch residue from the bottom surface of the structure. The method of depositing a capping layer includes depositing the capping layer over the bottom surface of the structure. The methods described herein reduce the amount of unwanted metal oxides and residue, which improves adhesion of deposited capping layers.


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