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For the Inventor, By the Inventor

San Jose, CA, United States of America

Hao Jiang

LinkedIn
USPTO Granted Patents = 12 

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 31(Granted Patents)


Company Filing History:

goldMedal12 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2020-2024

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):
1. 11967527 - Fully aligned subtractive processes and electronic devices therefrom (2024-04-23),
2. 11923244 - Subtractive metals and subtractive metal semiconductor structures (2024-03-05),
3. 11908696 - Methods and devices for subtractive self-alignment (2024-02-20),
4. 11830725 - Method of cleaning a structure and method of depositing a capping layer in a structure (2023-11-28),
5. 11749532 - Methods and apparatus for processing a substrate (2023-09-05),
6. 11508617 - Method of forming interconnect for semiconductor device (2022-11-22),
7. 11410885 - Fully aligned subtractive processes and electronic devices therefrom (2022-08-09),
8. 11257677 - Methods and devices for subtractive self-alignment (2022-02-22),
9. 11205589 - Methods and apparatuses for forming interconnection structures (2021-12-21),
10. 11101174 - Gap fill deposition process (2021-08-24),
11. 10957533 - Methods for etching a structure for semiconductor applications (2021-03-23),
12. 10692759 - Methods for manufacturing an interconnect structure for semiconductor devices (2020-06-23),

Title: Innovations of Hao Jiang in Semiconductor Technology

Introduction

Hao Jiang is a prominent inventor based in San Jose, California, known for his significant contributions to semiconductor technology. With a total of 12 patents to his name, he has made remarkable advancements in the field, particularly in the area of fully aligned subtractive processes and electronic devices.

Latest Patents

Hao Jiang's latest patents include innovative methods for forming fully aligned vias that connect two metal lines extending in two directions. These methods ensure that the fully aligned via is accurately aligned with both the first and second metal lines. Additionally, he has developed processes related to subtractive metals and subtractive metal semiconductor structures. These embodiments focus on the fabrication of semiconductor structures, including operations such as degas and sputter operations, as well as the deposition of metal layers with specific resistivity characteristics.

Career Highlights

Hao Jiang is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to push the boundaries of semiconductor technology and contribute to the development of advanced manufacturing processes.

Collaborations

Throughout his career, Hao Jiang has collaborated with notable colleagues, including Mehul B Naik and He Ren. These collaborations have fostered an environment of innovation and have led to the successful development of cutting-edge technologies in the semiconductor field.

Conclusion

Hao Jiang's contributions

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