Chenfei Shen

Title: Innovations of Chenfei Shen

Introduction

Chenfei Shen is a notable inventor based in San Jose, California. He has made significant contributions to the field of electronic devices, particularly in the area of tungsten film formation. With a total of three patents to his name, Shen's work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is titled "Method of reducing titanium nitride etching during tungsten film formation." This patent describes methods for forming electronic devices that include tungsten film stacks. The methods involve creating a tungsten nucleation layer on a barrier layer using an atomic layer deposition (ALD) process that utilizes a tungsten precursor free of fluorine. Additionally, the patent outlines how to control process parameters and form a WSi pre-nucleation layer. Another significant patent is "Fluorine-free tungsten ALD for dielectric selectivity improvement." This patent details methods for forming metallic tungsten films selectively on conductive surfaces compared to dielectric surfaces. The process includes exposing a substrate to specific conditions to deposit a tungsten-containing film, which is then converted to a metallic tungsten film through further exposure.

Career Highlights

Chenfei Shen is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to focus on innovative solutions that enhance the manufacturing processes of electronic devices.

Collaborations

Throughout his career, Shen has collaborated with talented individuals, including Chi-Chou Lin and Kedi Wu. These collaborations have contributed to the advancement of technologies in the field.

Conclusion

In summary, Chenfei Shen is an accomplished inventor whose patents have significantly influenced the development of electronic devices. His innovative methods and collaborations continue to drive advancements in the semiconductor industry.