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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Amrita B Mullick

USPTO Granted Patents = 13 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:

goldMedal7 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal6 out of 27 
 
Micro Materials Inc.
 patents

Years Active: 2020-2024

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13 patents (USPTO):
1. 12173413 - High pressure oxidation of metal films (2024-12-24),
2. 11705366 - Methods for controllable metal and barrier-liner recess (2023-07-18),
3. 11515207 - Methods of forming metal chalcogenide pillars (2022-11-29),
4. 11462438 - Volumetric expansion of metal-containing films by silicidation (2022-10-04),
5. 11232955 - Methods of etching metal oxides with less etch residue (2022-01-25),
6. 11189529 - Methods of forming metal chalcogenide pillars (2021-11-30),
7. 11131015 - High pressure oxidation of metal films (2021-09-28),
8. 11062942 - Methods for controllable metal and barrier-liner recess (2021-07-13),
9. 11037825 - Selective removal process to create high aspect ratio fully self-aligned via (2021-06-15),
10. 10892183 - Methods for removing metal oxides (2021-01-12),
11. 10790191 - Selective removal process to create high aspect ratio fully self-aligned via (2020-09-29),
12. 10699953 - Method for creating a fully self-aligned via (2020-06-30),
13. 10622221 - Methods of etching metal oxides with less etch residue (2020-04-14),

Title: Amrita B Mullick: Innovator in Metal Film Processing

Introduction

Amrita B Mullick is a prominent inventor based in Santa Clara, CA, known for her significant contributions to the field of metal film processing. With a total of 13 patents to her name, she has made remarkable advancements in methods that enhance the efficiency and effectiveness of thin film oxidation.

Latest Patents

Among her latest patents is a method for the high-pressure oxidation of metal films. This innovative approach allows for processing thin films at pressures greater than 2 bar, enabling lower temperatures and shorter exposure times compared to traditional methods. Additionally, she has developed methods for controllable metal and barrier-liner recess, which involve etching a metal layer and a metal-containing barrier layer to a predetermined depth. These methods are particularly useful in semiconductor manufacturing, where precision is crucial.

Career Highlights

Throughout her career, Amrita has worked with leading companies in the industry, including Applied Materials, Inc. and Micro Materials Inc. Her expertise in metal film processing has positioned her as a key player in the development of advanced manufacturing techniques.

Collaborations

Amrita has collaborated with notable professionals in her field, including Regina Germanie Freed and Uday Mitra. These partnerships have further enriched her work and contributed to the success of her innovative projects.

Conclusion

Amrita B Mullick's contributions to metal film processing and her impressive portfolio of patents highlight her role as a leading inventor in the industry. Her work continues to influence advancements in semiconductor technology and manufacturing processes.

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