The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Oct. 14, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Pramit Manna, Sunnyvale, CA (US);
Swaminathan T. Srinivasan, Pleasanton, CA (US);
Timothy J. Franklin, Campbell, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B08B 9/032 (2006.01); C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 9/0321 (2013.01); C23C 16/4404 (2013.01); C23C 16/45565 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/32449 (2013.01); H01J 37/32862 (2013.01);
Abstract
A method for cleaning one or more interior surfaces of a processing chamber includes removing a processed substrate from the processing chamber, and introducing a first cleaning chemistry into the processing chamber to generate a first internal pressure of greater than 1.1 atm within the processing chamber and remove deposited contaminants from the one or more interior surfaces of the processing chamber. The method further comprises removing the cleaning chemistry from the processing chamber.