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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Pramit Manna

This inventor holds 85 USPTO granted patents and 27 published patent applications, primarily in Carbon Film Technology (CPC class H01L21-02274). Top assignee: Applied Materials, Inc.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pramit Manna. Retrieved from https://idiyas.com/inventor/pramit-manna

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 85 

% Patents Active = 91.8

Average Co-Inventor Count = 4.6

ph-index = 7

Forward Citations = 555(Granted Patents)

Forward Citations (Not Self Cited) = 522(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Milpitas, CA (US) (2018 - 2019)
  • Sunnyvale, CA (US) (2017 - 2023)
  • Santa Clara, CA (US) (2016 - 2024)

Company Filing History:

goldMedal85 out of 14,482 
 
Applied Materials, Inc.
 patents

Years Active: 2016-2026

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Areas of Expertise:
Magnetic Housing Systems
Pulsed Plasma Deposition
High Density Carbon Films
Thermally Stable Carbon Film
Conformal Amorphous Silicon
Hardmask Formation
High Bias Deposition
Flowable Film Curing
Nitrogen-Doped Carbon Films
Dielectric Films
3D NAND Etch
PECVD Tungsten Films
85 patents (USPTO):Explore Patents
1. 12555741 - Magnetic housing systems (2026-02-17),
2. 12486577 - Pulsed plasma (DC/RF) deposition of high quality C films for patterning (2025-12-02),
3. 12463036 - High density carbon films for patterning applications (2025-11-04),
4. 12362181 - Methods of forming thermally stable carbon film (2025-07-15),
5. 12325910 - Deposition of conformal and gap-fill amorphous silicon thin-films (2025-06-10),
6. 12221694 - Conditioning of a processing chamber (2025-02-11),
7. 12173413 - High pressure oxidation of metal films (2024-12-24),
8. 12106958 - Method of using dual frequency RF power in a process chamber (2024-10-01),
9. 12054827 - Flowable film curing using H2 plasma (2024-08-06),
10. 11842897 - High density carbon films for patterning applications (2023-12-12),
11. 11784042 - Carbon hard masks for patterning applications and methods related thereto (2023-10-10),
12. 11721545 - Method of using dual frequency RF power in a process chamber (2023-08-08),
13. 11699585 - Methods of forming hardmasks (2023-07-11),
14. 11676858 - High bias deposition of high quality gapfill (2023-06-13),
15. 11664226 - Methods for producing high-density carbon films for hardmasks and other patterning applications (2023-05-30),

Title: Innovator Spotlight: Pramit Manna - Pioneering High-Density Carbon Films

Introduction:

Pramit Manna, a prolific inventor based in Sunnyvale, CA (US), is making waves in the field of materials science with his groundbreaking work in high-density carbon films. With an impressive portfolio of 76 patents to his name, Pramit is at the forefront of innovation in the semiconductor industry.

Latest Patents:

One of Pramit's recent patents focuses on "High density carbon films for patterning applications," where he explores the deposition of high transparency, high-density carbon films for various applications. Another notable patent is "Carbon hard masks for patterning applications," which unveils methods of depositing amorphous carbon layers using a plasma-enhanced chemical vapor deposition (PECVD) process.

Career Highlights:

Pramit Manna is a key player at Applied Materials, Inc., a leading technology company driving advancements in semiconductor manufacturing. His expertise in materials science and deposition processes has led to significant contributions in the development of cutting-edge technologies.

Collaborations:

Pramit collaborates closely with accomplished colleagues like Abhijit Basu Mallick and Eswaranand Venkatasubramanian, who share his passion for innovation and excellence. Together, they form a dynamic team dedicated to pushing the boundaries of what is possible in the world of materials engineering.

Conclusion:

In conclusion, Pramit Manna's exemplary work in the field of high-density carbon films exemplifies his commitment to driving innovation and pushing the boundaries of materials science. With a track record of success and a bright future ahead, Pramit is a true visionary in the world of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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