The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Jun. 27, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Anup Kumar Singh, Santa Clara, CA (US);

Rick Kustra, San Jose, CA (US);

Vinayak Vishwanath Hassan, San Francisco, CA (US);

Bhaskar Kumar, San Jose, CA (US);

Krishna Nittala, San Jose, CA (US);

Pramit Manna, Santa Clara, CA (US);

Kaushik Alayavalli, Sunnyvale, CA (US);

Ganesh Balasubramanian, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 7/00 (2006.01); C23C 16/26 (2006.01); C23C 16/44 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); B08B 7/0035 (2013.01); C23C 16/26 (2013.01); C23C 16/4405 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/3244 (2013.01); H01J 37/32862 (2013.01); H01L 21/02115 (2013.01); H01L 21/0332 (2013.01);
Abstract

Embodiments of the present disclosure generally relate to methods for cleaning a chamber comprising introducing a gas to a processing volume of the chamber, providing a first radiofrequency (RF) power having a first frequency of about 40 MHz or greater to a lid of the chamber, providing a second RF power having a second frequency to an electrode disposed in a substrate support within the processing volume, and removing at least a portion of a film disposed on a surface of a chamber component of the chamber. The second frequency is about 10 MHz to about 20 MHz.


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