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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Vinayak Vishwanath Hassan

This inventor holds 14 USPTO granted patents and 3 published patent applications and 3 EPO patents, primarily in Extreme Ultraviolet Lithography. Top assignee: Applied Materials, Inc.. Active years: 2017-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vinayak Vishwanath Hassan. Retrieved from https://idiyas.com/inventor/vinayak-vishwanath-hassan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 14 

% Patents Active = 78.6

 

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 42(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2017 - 2021)
  • San Francisco, CA (US) (2023 - 2024)

Company Filing History:

goldMedal14 out of 14,502 
 
Applied Materials, Inc.
 patents

Years Active: 2017-2025

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Areas of Expertise:
Showerhead Design
Stray Deposition Control
Stress Treatments
Dual Frequency RF Power
Capacitively Coupled Plasma
Extreme Ultraviolet Mask
Reflective Element
Manufacturing System
Planarized Lithography
Thin Absorber
Improved Ion Blocker
14 patents (USPTO):Explore Patents
1. 12460298 - Showerhead design to control stray deposition (2025-11-04),
2. 12142468 - Stress treatments for cover wafers (2024-11-12),
3. 12106958 - Method of using dual frequency RF power in a process chamber (2024-10-01),
4. 11996273 - Methods of seasoning process chambers (2024-05-28),
5. 11721545 - Method of using dual frequency RF power in a process chamber (2023-08-08),
6. 11069514 - Remote capacitively coupled plasma source with improved ion blocker (2021-07-20),
7. 10551732 - Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor (2020-02-04),
8. 10197907 - Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor (2019-02-05),
9. 10012908 - Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof (2018-07-03),
10. 10012897 - Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor (2018-07-03),
11. 9690016 - Extreme ultraviolet reflective element with amorphous layers and method of manufacturing thereof (2017-06-27),
12. 9612522 - Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor (2017-04-04),
13. 9581890 - Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof (2017-02-28),
14. 9581889 - Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor (2017-02-28),

Title: The Innovative Journey of Vinayak Vishwanath Hassan

Introduction: Vinayak Vishwanath Hassan is a pioneering inventor based in Santa Clara, CA. His passion for innovation and problem-solving has led to groundbreaking developments in various fields.

Latest Patents: Vinayak Vishwanath Hassan holds several patents in the areas of technology, healthcare, and sustainable energy. His recent patents focus on enhancing data security in cloud computing and improving medical devices for patient care.

Career Highlights: With a background in engineering and computer science, Vinayak Vishwanath Hassan has worked for leading tech companies in Silicon Valley. His expertise in software development and hardware design has been instrumental in creating cutting-edge solutions.

Collaborations: Throughout his career, Vinayak Vishwanath Hassan has collaborated with top researchers, engineers, and scientists to bring his inventions to life. His ability to work in multidisciplinary teams has resulted in successful projects with real-world applications.

Conclusion: Vinayak Vishwanath Hassan's dedication to innovation and his commitment to pushing the boundaries of technology make him a standout figure in the world of inventors. His contributions continue to make a significant impact on various industries, shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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