The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2017

Filed:

Apr. 24, 2015
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Ralf Hofmann, Soquel, CA (US);

Vinayak Vishwanath Hassan, Santa Clara, CA (US);

Cara Beasley, Scotts Valley, CA (US);

Majeed A. Foad, Sunnyvale, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01); C23C 14/06 (2006.01); C23C 14/14 (2006.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); C23C 14/0605 (2013.01); C23C 14/0635 (2013.01); C23C 14/14 (2013.01); C23C 16/44 (2013.01); G03F 7/70033 (2013.01); G03F 7/70316 (2013.01); G21K 1/062 (2013.01); H01J 37/32798 (2013.01); H01J 37/3429 (2013.01);
Abstract

An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.


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