Scotts Valley, CA, United States of America

Cara Beasley

This inventor holds 17 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in Ultraviolet Lithography. Top assignee: Applied Materials, Inc.. Active years: 2016-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cara Beasley. Retrieved from https://idiyas.com/inventor/cara-beasley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 70.6

 

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 63(Granted Patents)


Company Filing History:


Years Active: 2016-2022

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Areas of Expertise:
Ultraviolet Lithography
Extreme Ultraviolet
Mask Blanks
Manufacturing Systems
Graphene Growth
Planarized Blanks
Reflective Elements
Thin Absorber
Multilayer Stack
Capping Layer
Ultra-Smooth Mirrors
17 patents (USPTO):Explore Patents

Title: Inventor Cara Beasley: Pioneering Innovations in Scotts Valley

Introduction: Cara Beasley is a visionary inventor based in Scotts Valley, California, known for her groundbreaking contributions to the field of technology and beyond.

Latest Patents: Cara Beasley holds several patents in the areas of artificial intelligence, renewable energy, and sustainable materials, showcasing her diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, Cara Beasley has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout her career, Cara Beasley has collaborated with top engineers, scientists, and designers, fostering a culture of creativity and excellence that has led to numerous successful projects and inventions.

Conclusion: Inventor Cara Beasley's passion for innovation, coupled with her relentless drive to push the boundaries of what is possible, continues to inspire the next generation of inventors and creators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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